Fabrication process of semiconductor package and semiconductor package

ABSTRACT

A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.

This is a divisional application of application Ser. No. 09/326,316filed Jun. 7, 1999 which is in turn a continuation of application Ser.No. 08/716,362 filed Sep. 18, 1996 now U.S. Pat. No. 5,976,912.

TECHNICAL FIELD

This invention relates to a process for the fabrication of asemiconductor package and also to a semiconductor package.

BACKGROUND ART

As the level of integration of semiconductors becomes higher, the numberof input/output terminals increases. A need has therefore arisen for asemiconductor package having many input/output terminals. In general,input/output terminals can be divided into two types, one being thosearranged in a single row along a periphery of a package and the otherbeing those arranged in multiple arrays not only along a periphery of apackage but also inside the package. The former is typified by QFPs(Quad Flat Packages). To provide them with many terminals, it isnecessary to reduce the pitch of the the terminals. In a pitch range of0.5 mm and shorter, an advanced technique is required for theirconnection with a printed board. The latter array type permits arrangingterminals at a relatively large pitch and is hence suited for a high pincount.

Among such array types, PGAs (Pin Grid Array) which are provided withconnecting pins have heretofore been commonly used. However, theirconnections with printed boards are conducted by insertion, so that theyare not suited for surface mounting. To overcome this inconvenience,packages called BGAs (Ball Grid Arrays) which permit surface mountinghave been developed. These BGAs can be classified into (1) the ceramictype, (2) the printed wiring board type and (3) the tape type making useof TAB (tape automated bonding). Of these, the ceramic type has ashorter distance between a mother board and a package compared with theconventional PGAs so that a warp in the package due to a difference inthermal stress between the mother board and the package remains aserious problem. Further, the printed wiring board type is alsoaccompanied by problems such as substrate warping, low moistureresistance, low reliability and large substrate thickness. Tape BGAsmaking use of the TAB technology have therefore been proposed.

With a view to meeting a further reduction in the package size, packageshaving substantially the same size as semiconductor chips, namely,so-called chip size packages (CSP) have been proposed. Each of them hasconnecting portions, which are to be connected with an external printedboard, in a mounting area rather than at a peripheral portion of asemiconductor chip.

Specific examples of such CSPs include those fabricated by bonding abumped polyimide film to a surface of a semiconductor chip, establishingelectrical connection with the chip and gold lead wires, and potting anepoxy resin or the like to seal the resultant package (NIKKEI MATERIALS& TECHNOLOGY, No. 140, pp.18-19, April, 1994) and those obtained byforming metal bumps on a temporary substrate at positions correspondingto points of connection between a semiconductor chip and an externalprinted board, bonding the semiconductor chip facedown, and subjectingit to transfer molding on the temporary substrate (SmallestFlip-Chip-Like Package CSP; The Second VLSI Packaging Workshop of Japan,pp.46-50, 1994).

On the other hand, packages making use of a polyimide tape as a basefilm are studied in the fields of BGAs and CSPs as mentioned above. Inthis case, as the polyimide tape, one having a copper foil laminated ona polyimide film via an adhesive layer is commonly employed. However,from the viewpoint of heat resistance and moisture resistance, onehaving a polyimide layer formed directly on a copper foil, that is, aso-called two-layer flexible base material, is preferred. Productionprocesses of such two-layer flexible base materials are roughly dividedinto (1) a process in which polyamic acid as a precursor for a polyimideis coated on a copper foil and is then hardened and (2) a process inwhich a thin metal film is formed on a hardened polyimide film by vacuumdeposition or electroless plating. To provide, for example, holesreaching the copper foil by removing the polyimide at desired portions(which correspond to portions capable of exhibiting a second connectingfunction) while applying laser beam machining, it is preferred to makethe polyimide film as thin as possible. In contrast, upon forming atwo-layer flexible base material into the form of a leadframe andhandling the same, a base film of a small thickness involves problemssuch as low handling readiness and insufficient rigidity as a frame.

As has been described above, various proposals have been made assemiconductor packages capable of meeting miniaturization and highintegration. Nevertheless, further improvements are desired to providesatisfaction in all aspects such as performance, characteristics andproductivity.

An object of the present invention is to provide a process for thefabrication of a semiconductor package, the process making it possibleto stably fabricate with good productivity semiconductor packagescapable of meeting miniaturization and high integration, and also toprovide such a semiconductor package.

DISCLOSURE OF THE INVENTION

In a first aspect of the present invention, there is thus provided aprocess for the fabrication of a semiconductor package, which comprisesthe following steps:

1A) forming wiring on one side of a conductive temporary supportingmember;

1B) mounting a semiconductor device on the conductive temporarysupporting member on which the wiring has been formed, and thenelectrically connecting a terminal of the semiconductor device with thewiring;

1C) sealing the semiconductor device with resin;

1D) removing the conductive temporary supporting member to expose thewiring;

1E) forming an insulating layer over the exposed wiring at an area otherthan a position where an external connection terminal is to be formed;and

1F) forming the external connection terminal on the wiring at thepositions where the insulating-layer has not been formed.

In a second aspect of the present invention, there is also provided aprocess for the fabrication of a semiconductor package, which comprisesthe following steps:

2A) forming wiring on one side of a conductive temporary supportingmember;

2B) forming an insulating supporting member over the one side of theconductive temporary supporting member, the one side carrying the wiringformed thereon;

2C) removing the conductive temporary supporting member and thentransferring the wiring onto the insulating supporting member;

2D) removing the insulating supporting member at positions where anexternal connection terminal is to be formed for the wiring, whereby athrough-holes is formed for the external connection terminal;

2E) mounting a semiconductor device on the insulating supporting memberon which the wiring has been transferred, and then electricallyconnecting a terminal of the semiconductor device with the wiring;

2G) sealing the semiconductor device with resin; and

2H) forming, in the through-hole for the external connection terminal,the external connection terminal so that the external connectionterminal is electrically connected to -the wiring.

In the second aspect of the invention, it is preferable to proceed from2A to 2H; here, step 2D can come before 2B. For example, step 2B can beconducted by bonding an insulating film insulating supporting memberpreviously provided with an external connection terminal through-holewith one side of the conductive temporary supporting member, the oneside carrying the wiring pattern formed thereon.

In a third aspect of the present invention, there is also provided aprocess for the fabrication of a semiconductor package, which comprisesthe following steps:

3A) forming wiring on one side of a conductive temporary supportingmember;

3B) mounting a semiconductor device on the conductive temporarysupporting member on which the wiring has been formed, and thenelectrically connecting a terminal of the semiconductor device with thewiring;

3C) sealing the semiconductor device with resin;

3D) removing the conductive temporary supporting member at an area otherthan positions where an external connection terminal for the wiring isto be formed, whereby the external connection terminal made from theconductive temporary supporting member is formed; and

3E) forming an insulating layer at the area other than the position ofthe external connection terminal.

In a fourth aspect of the present invention, there is also provided aprocess for the fabrication of a semiconductor package, which comprisesthe following steps:

4A) forming a wiring on one side of a conductive temporary supportingmember;

4B) mounting a semiconductor device on the conductive temporarysupporting member on which the wiring has been formed, and thenelectrically connecting a terminal of the semiconductor device with thewiring;

4C) sealing the semiconductor device with resin;

4D) forming a metal pattern, which is different in conditions forremoval from the conductive temporary supporting member, on another sideof the conductive temporary supporting member, the another side beingopposite to the one side where the semiconductor device has beenmounted, at a position where an external connection terminal for thewiring is to be formed; and

4E) removing the conductive temporary supporting member at an area otherthan the position where the metal pattern has been formed.

As a metal pattern, it is preferable to use solder. Further, gold layeron nickel layer can be used.

In a fifth aspect of the present invention, there is also provided aprocess for the fabrication of semiconductor packages, which comprisesthe following steps:

5A) forming plural sets of wiring on one side of an insulatingsupporting member;

5B) removing the insulating supporting member at positions whereexternal connection terminals for the wiring are to be formed, wherebythrough-holes for the external connection terminals are provided;

5C) mounting semiconductor devices on the insulating supporting memberon which the plural sets of wiring have been formed, and thenelectrically connecting terminals of the semiconductor devices with thewiring, respectively;

5D) sealing the semiconductor devices with resin;

5E) forming, in the through-holes for the external connection terminals,the external connection terminals so that the external connectionterminals are electrically connected to the wiring; and

5F) separating the resultant assembly into individual semiconductorpackages.

In the fifth aspect of the invention, it is preferable to proceed from5A to 5F. However, 5A and 5B can be reversed. In other words, aplurality of sets of wiring can be formed on an insulating supportingmember provided with through-holes for external connection terminals.

In a sixth aspect of the present invention, there is also provided aprocess for the fabrication of semiconductor packages, which comprisesthe following steps:

6A) forming plural sets of wiring on one side of a conductive temporarysupporting member;

6B) cutting apart the conductive temporary supporting member so that theplural sets of wiring formed on the conductive temporary supportingmember are divided to include a predetermined number of wiring per unit,and then fixing on a frame the separated conductive temporary supportingmember with the wiring formed thereon;

6C) mounting semiconductor devices on the conductive temporarysupporting members on which the wiring has been formed, and thenelectrically connecting terminals of the semiconductor devices with thewiring, respectively;

6D) sealing the semiconductor devices with resin;

6E) removing the conductive temporary supporting member to expose thewiring;

6F) forming an insulating layer over the exposed wiring at areas otherthan positions where external connection terminals are to be formed;

6G) forming the external connection terminals at the positions where theinsulating layer for the wiring has not been formed; and

6H) separating the resultant assembly into individual semiconductorpackages.

The predetermined number of wiring per unit in step 6B is preferred tobe one. However, in order to improve productivity, it can be more thanone.

In a seventh aspect of the present invention, there is also provided aprocess for the fabrication of semiconductor packages, which comprisesthe following steps:

7A) forming plural sets of wiring on one side of an insulatingsupporting member;

7B) removing the insulating supporting member at positions whereexternal connection terminals for the wiring are to be formed, wherebythrough-holes for the external connection terminals are provided;

7C) cutting apart the insulating supporting member so that the pluralsets of wiring formed on the insulating supporting member are divided toinclude a predetermined number of wiring per unit, and then fixing on aframe the separated insulating supporting member with the wiring formedthereon;

7D) mounting semiconductor devices on the insulating supporting memberson which the wiring have been formed, and then electrically connectingterminals of the semiconductor devices with the wiring, respectively;

7E) sealing the semiconductor devices with resin;

7F) forming, in the through-holes for the external connection terminals,the external connection terminals so that the external connectionterminals are electrically connected to the wiring; and

7G) separating the resultant assembly into individual semiconductorpackages.

In the fabrication process, it is preferable to proceed from 7A to 7G.However, 7A and 7B can be reversed as in the fifth aspect of theinvention.

In an eighth aspect of the present invention, there is also provided aprocess for the fabrication of a semiconductor package provided with asingle layer of wiring, one side of the wiring having a first connectingfunction of being connected with a semiconductor device and an oppositeside of the wiring having a second connecting function of being to beconnected to external wiring, which comprises the following steps 8A,8B, 8C and 8D:

8A) working a heat-resistant insulating base material having a metalfoil, thereby forming the metal foil wiring patterns;

8B) forming a hole at a position for exhibiting the second connectingfunction which is to be formed in a subsequent step, so that the holeextends from a side of the insulating base material to the wiringpatterns;

8C) bonding a frame base material, which makes an opening through apredetermined portion thereof, to desired position on a surface of thewiring patterns and a surface of the insulating base material, thelatter surface being located adjacent the wiring patterns, respectively;and

8D) mounting the semiconductor device, electrically connecting aterminal of the semiconductor device with the wiring pattern, and thensealing the semiconductor device with resin.

In the eight aspect of the invention, it is preferable to proceed from8A to 8D. However, 8A and 8B can be reversed. In other words, metal foilcan be formed into wiring patterns after a hole is formed on theinsulating base material to extend to the metal foil.

In a ninth aspect of the present invention, there is also provided aprocess for the fabrication of semiconductor packages provided with asingle layer of a wiring, one side of the wiring having a firstconnecting function of being connected with a semiconductor device andan opposite side of the wiring having a second connecting function ofbeing to be connected to external wiring, which comprises the followingsteps 9A, 9B, 9C, 9D, and 9E:

9A) working a heat-resistant insulating base material having a metalfoil, thereby forming the metal foil into plural sets of wiringpatterns;

9B) forming a hole at a position for exhibiting the second connectingfunction which is to be formed in a subsequent step, so that the holeextends from a side of the insulating base material to the wiringpatterns;

9C) bonding a second insulating base material, which makes an openingthrough a predetermined portion thereof, to a desired position on asurface of the wiring patterns and a surface of the insulating basematerial, the latter surface being located adjacent to the wiringpatterns, respectively, whereby an insulating supporting member isformed;

9D) cutting apart the insulating supporting member so that the pluralsets of wiring formed on the insulating supporting member are divided toinclude a predetermined number of wiring per unit, and then fixing on aframe the separated insulating supporting member with the wiring formedthereon; and

9E) mounting the semiconductor device, electrically connecting aterminal of the semiconductor device with the wiring, and then sealingthe semiconductor device with resin.

In the ninth aspect of the invention, it is preferable to proceed from9A to 9E. However, 9A and 9B can be reversed as in the eight aspect ofthe invention.

In a tenth aspect of the present invention, there is also provided aprocess for the fabrication of semiconductor packages, which comprisesthe following steps:

10A) forming plural sets of wiring on one side of a supporting member;

10B) mounting plural semiconductor devices on the supporting member onwhich the wiring have been formed, and then electrically connectingterminals of the semiconductor devices with the wiring;

10C) subjecting the plural sets of electrically-connected semiconductordevice and wiring to gang sealing with resin;

10D) removing desired portions of the supporting member to exposepredetermined portions of the wiring, and forming external connectionterminals so that the external connection terminals are electricallyconnected to the exposed wiring; and

10E) separating the resultant assembly into individual semiconductorpackages.

Metal foil can be used as the supporting member, and wiring patterns canbe exposed by removing the supporting member after sealing with resin.

Further, the supporting member can be an insulating base material, andnonthrough-holes reaching the wiring patterns can be formed by removinga predetermined section of an insulating base material after sealingwith resin.

In an eleventh aspect of the present invention, there is also provided aprocess for the fabrication of a semiconductor device packaging frame,the frame being provided with plural semiconductor-device-mountingportions, portions connecting the plural semiconductor-device-mountingportions, and a registration mark portion, which comprises the followingsteps:

(a) forming wiring for the semiconductor-device-mounting portions on aconductive temporary substrate,

(b) transferring the wiring onto a resin substrate, and

(c) etching off the conductive temporary substrate;

wherein upon etching off the conductive temporary substrate in step (c),the conductive temporary substrate partly remains to form some of theconnecting portions.

In the present invention, usual semiconductor devices such as LSI chipsor IC chips can be used as the semiconductor devices.

To electrically connect the terminal of the semiconductor device withthe wiring, it is possible to use not only wire bonding but also usualmeans such as a bump or an anisotropic conductive film.

In the present invention, a warp-free and deformation-free semiconductorpackage can be fabricated by subjecting a hardened sealing resin to heattreatment after a semiconductor device is sealed with resin.

The heat treatment can be conducted preferably at a temperature in arange of the glass transition point of the hardened sealing resin ±20°C., because the hardened resin exhibits strongest plastic properties inthe range of the glass transition point of the hardened sealing resin±20° C., thereby facilitating elimination of residual strain. If thetemperature of the heat treatment is lower than the glass transitionpoint −20° C., the hardened resin becomes a glassy elastic substance sothat relaxation effects tend to be lessened. If the temperature ishigher than the glass transition point +20° C., the hardened resin turnsto a rubbery elastic substance so that effect of strain elimination alsotend to be reduced.

A warp or deformation in the semiconductor package can be morecompletely eliminated by cooling the semiconductor package to roomtemperature at a temperature-lowering rate of 5° C./min or less afterthe semiconductor package is heat-treated at a temperature in thetemperature of the glass transition point of the hardened sealing resin±20° C.

It is preferred to conduct the heat-treatment and/or cooling step whilepressing upper and lower surfaces of the hardened sealing resin by rigidflat plates under forces that reduce a warp or deformation in thehardened sealing resin.

In the semiconductor package according to the present invention, thewiring, where it is a single-layer wiring, is designed so that one sideof the wiring has a first connecting function for permitting connectionwith the semiconductor chip and an opposite side of the wiring has asecond connecting function enabling connection to the external wiring.

For the external connection terminals which are to be connected to theexternal wiring, solder bumps, gold bumps or the like can preferably beused.

From the standpoint of high densification, it is preferred to arrangethe external connection terminals on a side further inward than aposition where terminals of the semiconductor device are electricallyconnected by wire bonding or the like (fan-in type). As is understoodfrom the foregoing, it is preferred from the standpoint of highdensification to arrange the external connection terminals in agrid-like pattern on a lower side on which the semiconductor device ismounted.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 2 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 3 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 4 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 5 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 6 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 7 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 8 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 9 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 10 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 11 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 12 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 13 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 14 is a plan view illustrating the process according to anembodiment of the present invention for the fabrication of thesemiconductor package;

FIG. 15 is a plan view illustrating the process according to anembodiment of the present invention for the fabrication of thesemiconductor package;

FIG. 16 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 17 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 18 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 19 is a cross-sectional view illustrating a process. according toan embodiment of the present invention for the fabrication of asemiconductor package;

FIG. 20 is a cross-sectional view illustrating the process according toan embodiment of the present invention for the fabrication of thesemiconductor package;

FIG. 21 is a cross-sectional view illustrating the process according toan embodiment of the present invention for the fabrication of thesemiconductor package;

FIG. 22 is a cross-sectional view illustrating a process according to anembodiment of the present invention for the fabrication of asemiconductor package;

FIG. 23 is a plan view illustrating a process according to an embodimentof the present invention for the fabrication of a semiconductor package;

FIG. 24 is a cross-sectional view illustrating the process according toan embodiment of the present invention for the fabrication of thesemiconductor package; and

FIG. 25 is a cross-sectional view illustrating the process according toan embodiment of the present invention for the fabrication of thesemiconductor package.

BEST MODE FOR CARRYING OUT THE INVENTION

With reference to FIG. 1, a description will be given of the firstembodiment of the present invention.

A nickel layer of 0.001 mm in thickness (not shown in FIG. 1) was platedon one side of an electrolytic copper foil 1 of 0.035 mm in thickness.Next, a photosensitive dry film resist (“PHOTEC HN340”, trade name;product of Hitachi Chemical Co., Ltd.) was laminated, exposed and thendeveloped, so that a plating resist for wiring pattern was formed.Subsequently, electrolytic copper plating was conducted in a coppersulfate bath. Applied further were a nickel plating to a thickness of0.003 mm or greater and a gold plating of 99.9% or higher purity to athickness of 0.0003 mm or greater. The plating resist was next strippedoff, whereby a wiring 2 was formed (FIG. 1a). On the copper foil 1 withthe wiring 2 formed thereon as described above, an LSI chip 3 wasmounted (FIG. 1b). For bonding the LSI chip, a silver paste 4 forsemiconductors was used. Next, LSI terminals and the wiring 2 wereconnected by wire bonds 100 (FIG. 1c). The thus-formed assembly wasloaded in a die for transfer mold and sealed with asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.) 5 (FIG. 1d). Thereafter, only the copperfoil 1 was dissolved away with an alkali etchant to expose the nickel.The nickel layer was removed with a nickel stripper having lowcopper-dissolving power so that the wiring portions were exposed (FIG.1e). Then, a solder resist 6 was coated and patterned in such a way thatconnecting terminal portions were exposed. Solder balls 7 were arrangedat the exposed portions of the wiring and were caused to fuse there(FIG. 1f). The wiring can be connected to an outer wiring via thesesolder balls 7.

Referring to FIG. 2, a description will be given of the secondembodiment of the present invention.

Following the procedures of FIG. 1, a copper foil 1 with a wiring 2 wasprepared (FIG. 2a). An LSI chip 3 was mounted. The LSI chip was providedwith gold bumps 8 at terminal portions. These gold bumps 8 and terminalportions of the wiring 2 were connected together by thermocompression(FIG. 2b). Next, a liquid epoxy resin 9 was filled underneath the LSIchip and cured (FIG. 2c). The thus-formed assembly was loaded in a diefor transfer mold and sealed with a semiconductor-sealing epoxy resin(“CL-7700”, trade name; product of Hitachi Chemical Co., Ltd.) 10 (FIG.2d). Thereafter, only the copper foil 1 was dissolved away with analkali etchant to expose the nickel. The nickel layer was removed with anickel stripper having low copper-dissolving power so that the wiringportions were exposed (FIG. 2e). Then, a solder resist 6 was coated andpatterned in such a way that connecting terminal portions were exposed.Solder balls 7 were arranged at the exposed portions of the wiring andwere caused to fuse there (FIG. 2f). The wiring can be connected to anouter wiring via these solder balls 7.

With reference to FIG. 3, a description will be given of the thirdembodiment of the present invention.

A nickel layer of 0.001 mm in thickness (not shown in FIG. 3) was platedon one side of an electrolytic copper foil 1 of 0.035 mm in thickness.Next, a photosensitive dry film resist (“PHOTEC HN340”, trade name;product of Hitachi Chemical Co., Ltd.) was laminated, exposed and thendeveloped, so that a plating resist for wiring pattern is formed.Subsequently, electrolytic copper plating was conducted in a coppersulfate bath, so that a first wiring 13 was formed. The plating resistwas next stripped off and the first wiring 13 was subjected at a surfacethereof to oxidation treatment and reduction treatment. Using a freshcopper foil and a polyimide-base bonding film (“AS2210”, trade name;product of Hitachi Chemical Co., Ltd.) 12 as a bonding resin, they werelaminated and bonded so that the wiring 13 was positioned inside. (Holesof 0.1 mm in diameter were formed through the copper foil 11 by aconventional photoetching process. By a panel plating process, innerwalls of the holes and the entire surface of the copper foil were platedwith copper.) The copper foil was formed into a second wiring 11 byphotoetching. The resin (the polyimide-base bonding film 12) was removedat an LSI-mounting portion by an excimer laser to expose terminalportions. The terminal portions were applied with a nickel plating to athickness of 0.003 mm or greater and further with a gold plating of99.9% or higher purity to a thickness of 0.0003 mm or greater (FIG. 3a).On the copper foil 1 with the two-layer wiring pattern formed thereon asdescribed above, an LSI chip was mounted. For bonding the LSI chip, asilver paste for semiconductors was used (FIG. 3b). Next, LSI terminalsand the wiring 13 were connected by wire bonds 100 (FIG. 3c). Thethus-formed assembly was loaded in a die for transfer mold and sealedwith a semiconductor-sealing epoxy resin (“CL-7700”, trade name; productof Hitachi Chemical Co., Ltd.) 5. Thereafter, only the copper foil 1 wasdissolved away with an alkali etchant to expose the nickel. The nickellayer was removed with a nickel stripper having low copper-dissolvingpower so that the wiring portions were exposed (FIG. 3e). Then, a solderresist 6 was coated and patterned in such a way that connecting terminalportions were exposed. Solder balls 7 were arranged at the exposedportions and were caused to fuse there (FIG. 3f). The wiring can beconnected to an outer wiring via these solder balls 7.

With reference to FIG. 4, a description will be given of the fourthembodiment of the present invention.

On an SUS (stainless steel) sheet 14 of 0.1 mm in thickness, aphotosensitive dry film resist (“PHOTEC HN340”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated, exposed and then developed,so that a plating resist for wiring pattern was formed. Subsequently,electrolytic copper plating was conducted in a copper sulfate bath.Applied further were a nickel plating to a thickness of 0.003 mm orgreater and a gold plating of 99.9% or higher purity to a thickness of0.0003 mm or greater. The plating resist was next stripped off, wherebya wiring 2 was formed (FIG. 4a). On the SUS sheet 14 with the wiring 2formed thereon as described above, a semiconductor chip 103 was mounted(FIG. 4b). For bonding the semiconductor chip, a silver paste 4 forsemiconductors was used. Next, semiconductor terminals and the wiring 2were connected by wire bonds 100 (FIG. 4c). The thus-formed assembly wasloaded in a die for transfer mold and sealed with asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.) 5 (FIG. 4d). Thereafter, the SUS sheet 14was mechanically stripped off to expose the wiring portion (FIG. 4e).Then, a solder resist 6 was coated and patterned in such a way thatconnecting terminal portions were exposed. Solder balls 7 were arrangedat the exposed portions of the wiring and were caused to fuse there(FIG. 4f). The wiring can be connected to an outer wiring via thesesolder balls 7, With reference to FIG. 5, a description will be given ofthe fifth embodiment of the present invention.

On an electrolytic copper foil of 0.035 mm in thickness, aphotosensitive dry film resist (“PHOTEC HN340”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated, exposed and then developed,so that a plating resist for wiring pattern was formed. Subsequent toapplication of a pattern plating 15 of nickel, electrolytic copperplating was conducted in a copper sulfate bath. Applied further were anickel plating to a thickness of 0.003 mm or greater and a gold platingof 99.9% or higher purity to a thickness of 0.0003 mm or greater. Theplating resist was next stripped off, whereby a wiring 2 was formed(FIG. 5a). On the copper foil 1 with the wiring 2 formed thereon asdescribed above, a semiconductor chip 103 was mounted (FIG. 5b). Forbonding the semiconductor chip, a silver paste 4 for semiconductors wasused. Next, semiconductor terminal portions and the wiring 2 wereconnected by wire bonds 100 (FIG. 5c). The thus-formed assembly wasloaded in a die for transfer mold and sealed with asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.) 5 (FIG. 5d). Thereafter, the copper foil 1was dissolved away with an alkali etchant to expose the wiring portionsof nickel (FIG. 5e). Then, a solder resist 6 was coated and patterned insuch a way that connecting terminal portions were exposed. Solder balls7 were arranged at the exposed portions of the wiring and were caused tofuse there (FIG. 5 f). The wiring can be connected to an outer wiringvia these solder balls 7.

With reference to FIG. 6, a description will be given of the sixthembodiment of the present invention.

On an electrolytic copper foil 1 of 0.035 mm in thickness, aphotosensitive dry film resist (“PHOTEC HN340”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated, exposed and then developed,so that a plating resist for wiring pattern was formed. Applied furtherwere a gold plating of 99.9% or higher purity to a thickness of 0.0003mm or greater and a nickel plating to a thickness of 0.003 mm orgreater. Further, electrolytic copper plating was conducted in a coppersulfate bath, and the plating resist was stripped off, whereby a wiring2 was formed (FIG. 6a). To the wiring-formed surface of the copper foil1 on which the wiring 2 was formed as described above, a polyimide film16 was bonded, connecting terminal portions of the wiring 2 were exposedby a laser (FIG. 6b), and the copper foil 1 was etched off (FIG. 6c). Asan alternative, use of a photosensitive film in place of the polyimidefilm 16 made it possible to expose connecting terminal portions withoutusing a laser. Subsequently, an LSI chip 3 was mounted on the surface ofthe polyimide film 16 on which the wiring pattern was formed. Forbonding the LSI chip, a silver paste 4 for semiconductors was used.Next, semiconductor terminal portions and the wiring 2 were connected bywire bonds 100 (FIG. 6d). The thus-formed assembly was loaded in a diefor transfer mold and sealed with a semiconductor-sealing epoxy resin(“CL-7700”, trade name; product of Hitachi Chemical Co., Ltd.) 5 (FIG.6e). Thereafter, solder balls 7 were arranged at the connecting terminalportions and were caused to fuse there (FIG. 6f). The wiring can beconnected to an outer wiring via these solder balls 7.

With reference to FIG. 7, a description will be given of the seventhembodiment of the present invention.

A nickel layer of 0.001 mm in thickness (not shown in FIG. 7) was platedon one side of an electrolytic copper foil 1 of 0.035 mm in thickness.Next, a photosensitive dry film resist (“PHOTEC HN340”, trade name;product of Hitachi Chemical Co., Ltd.) was laminated, exposed and thendeveloped, so that a plating resist for wiring pattern was formed.Subsequently, electrolytic copper plating was conducted in a coppersulfate bath. Applied further were a nickel plating to a thickness of0.003 mm or greater and a gold plating of 99.9% or higher purity to athickness of 0.0003 mm or greater. The plating resist was next strippedoff, whereby a wiring 2 was formed (FIG. 7a). On the copper foil 1 withthe wiring 2 formed thereon as described above, an LSI chip 3 wasmounted. For bonding the LSI chip, a silver paste 4 for semiconductorswas used. Next, semiconductor terminal portions and the wiring 2 wereconnected by wire bonds 100 (FIG. 7b). The thus-formed assembly wasloaded in a die for transfer mold and sealed with asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.) 5 (FIG. 7c). Thereafter, only the copperfoil 1 was dissolved away with an alkali etchant to expose the nickel.The nickel layer was removed with a nickel stripper having lowcopper-dissolving power so that the wiring portion was exposed (FIG.7d). Then, a polyimide film 16 with openings made therein as connectingterminal portions was bonded (FIG. 7e). Solder balls 7 were arranged atthe exposed portions of the wiring and were caused to fuse there (FIG.7f). The wiring can be connected to an outer wiring via these solderballs 7.

With reference to FIG. 8, a description will be given of the eighthembodiment of the present invention.

On an electrolytic copper foil 1 of 0.035 mm in thickness, aphotosensitive dry film resist (“PHOTEC HN340”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated, exposed and then developed,so that a plating resist for wiring pattern was formed. Applied furtherwere a gold plating of 99.9% or higher purity to a thickness of 0.0003mm or greater and a nickel plating to a thickness of 0.003 mm orgreater. Further, electrolytic copper plating was conducted in a coppersulfate bath, and the plating resist was stripped off, whereby a wiring2 was formed (FIG. 8a). To the wiring-formed surface of the copper foil1 on which the wiring pattern 2 was formed as described above, a liquidsealing resin 17 was coated by screen printing, and an insulating layerwas formed in such a manner that connecting terminal portions of thewiring 2 were exposed (FIG. 8b). After curing the liquid sealing resin,the copper foil 1 was etched off (FIG. 8c). Subsequently, an LSI chip 3was mounted on the surface of the hardened liquid sealing resin 16 inwhich the wiring pattern exist. For bonding the LSI chip, a silver paste4 for semiconductors was used. Next, semiconductor terminal portions andthe wiring 2 were connected by wire bonds 100 (FIG. 8d). The thus-formedassembly was loaded in a die for transfer mold and sealed with asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.) 5 (FIG. 8e). Thereafter, solder balls 7 werearranged at the connecting terminal portions of the wiring 2 and werecaused to fuse there (FIG. 8f). The wiring can be connected to an outerwiring via these solder balls 7.

With reference to FIG. 9, a description will be given of the ninthembodiment of the present invention.

A nickel layer of 0.001 mm in thickness (not shown in FIG. 9) was platedon one side of an electrolytic copper foil 1 of 0.035 mm in thickness.Next, a photosensitive dry film resist (“PHOTEC HN340”, trade name;product of Hitachi Chemical Co., Ltd.) was laminated, exposed and thendeveloped, so that a plating resist for wiring pattern was formed.Subsequently, electrolytic copper plating was conducted in a coppersulfate bath. Applied further were a nickel plating to a thickness of0.003 mm or greater and a gold plating of 99.9% or higher purity to athickness of 0.0003 mm or greater. The plating resist was next strippedoff, whereby a wiring 2 was formed (FIG. 9a). On the copper foil 1 withthe wiring 2 formed thereon as described above, an LSI chip 3 wasmounted. For bonding the LSI chip 3, a silver paste 4 for semiconductorswas used. Next, semiconductor terminals and the wiring 2 were connectedby wire bonds 100 (FIG. 9b). The thus-formed assembly was loaded in adie for transfer mold and sealed with a semiconductor-sealing epoxyresin (“CL-7700”, trade name; product of Hitachi Chemical Co., Ltd.) 5(FIG. 9c). Thereafter, only the copper foil 1 was dissolved away with analkali etchant to expose the nickel. The nickel layer was removed with anickel stripper having low copper-dissolving power so that the wiringportion was exposed (FIG. 9d). Then, a liquid sealing resin 17 wascoated by screen printing in such a manner that connecting terminalportions of the wiring 2 were exposed, and an insulating layer of theliquid sealing resin 17 was formed (FIG. 9e). After hardening of theliquid sealing resin 17, solder; balls 7 were arranged at the connectingterminal portions of the wiring 2 and were caused to fuse there (FIG.9f). The wiring can be connected to an outer wiring via these solderballs 7.

With reference to FIG. 10, a description will be made about the tenthembodiment of the present invention.

A nickel layer of 0.001 mm in thickness (not shown in FIG. 10) wasplated on one side of an electrolytic copper foil 1 of 0.035 mm inthickness. Next, a photosensitive dry film resist (“PHOTEC HN340”, tradename; product of Hitachi Chemical Co., Ltd.) was laminated, exposed andthen developed, so that a plating resist for a wiring pattern andregistration marks was formed. Subsequently, electrolytic copper platingwas conducted in a copper sulfate bath. Applied further were a nickelplating to a thickness of 0.003 mm or greater and a gold plating of99.9% or higher purity to a thickness of 0.0003 mm or greater. Theplating resist was next stripped off, whereby a wiring 2 andregistration marks 18 were formed (FIG. 10a). Only portions with theregistration marks 18 formed thereon were held between SUS sheets andthen pressed, whereby the registration marks were caused to appear onthe back side of the copper foil 1 as if they were die-stamped (FIG.10b). On the copper foil 1 with the wiring 2 and the registration mark18 formed thereon as described above, an LSI chip 3 was mounted (FIG.10c). For bonding the LSI chip 3, a silver paste 4 for semiconductorswas used. Next, semiconductor terminals and the wiring 2 were connectedby wire bonds 100 (FIG. 10d). The thus-formed assembly was loaded in adie for transfer mold and sealed with a semiconductor-sealing epoxyresin (“CL-7700”, trade name; product of Hitachi Chemical Co., Ltd.) 5(FIG. 10e). A photosensitive dry film was again laminated on the backside of the copper foil, and an etching pattern was formed by using theregistration marks 18. Thereafter, the copper foil 1 and the nickellayer were etched to form the copper foil 1 into bumps 7 and to exposethe wiring portion (FIG. 10f). Subsequently, a solder resist 8 wascoated, and an insulating layer was formed in such a way that the bumps7 were exposed (FIG. 10g). The wiring pattern can be connected to outerwiring via these bumps 7.

With reference to FIG. 11, a description will be given of the eleventhembodiment of the present invention.

On an electrolytic copper foil 1 of 0.035 mm in thickness, aphotosensitive dry film resist (“PHOTEC HN340”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated, exposed and then developed,so that a plating resist for plural sets of wiring patterns was formed.Applied further were a gold plating of 99.9% or higher purity to athickness of 0.0003 mm or greater and a nickel plating to a thickness of0.003 mm or greater. Further, electrolytic copper plating was conductedin a copper sulfate bath, and the plating resist was stripped off,whereby plural sets of wiring 2 were formed (FIG. 11a). To thepattern-formed surface of the copper foil 1 with the plural sets ofwiring 2 formed thereon as described above, a polyimide film 19 wasbonded, connecting terminal portions of the wiring 2 were exposed by alaser (FIG. 11b), and the copper foil 1 was etched off (FIG. 11c). Afterthe plural sets of wiring 2 were formed on the single polyimide film asdescribed above, LSI chips 3 were mounted. For bonding the LSI chips,die-bonding tapes 4′ for semiconductors were used. Next, semiconductorterminal portions and the wiring 2 were connected by wire bonds 100(FIG. 11d). The thus-formed assembly was loaded in a die for transfermold and sealed with a semiconductor-sealing epoxy resin (“CL-7700”,trade name; product of Hitachi Chemical Co., Ltd.) 5 (FIG. 11e).Thereafter, solder balls 7 were arranged at the connecting terminalportions of the wiring 2 and were caused to fuse there (FIG. 11f). Thewiring can be connected to outer wiring via these solder balls 7,respectively. Finally, the packages connected together with thepolyimide film were punched out by dies (FIG. 11g).

With reference to FIG. 12, a description will be given of the twelfthembodiment of the present invention.

An adhesive-coated polyimide film 20 of 0.07 mm in thickness was punchedby dies to form openings at portions where connecting terminals were tobe formed (FIG. 12a). After bonding a copper foil 21 of 0.035 mm inthickness (FIG. 12b), a photosensitive dry film resist (“PHOTEC HN340”,trade name; product of Hitachi Chemical Co., Ltd.) was laminated,exposed and then developed, so that an etching resist for plural sets ofwiring patterns was formed. Subsequently, the copper foil was etched andthe resist was stripped off, then plural sets of wiring patterns 2 wasformed (FIG. 12c). After the plural sets of wiring patterns were formedon the single polyimide film as described above, LSI chips 3 weremounted. For bonding the LSI chips 3, die-bonding tapes 4′ forsemiconductors were used. Next, semiconductor terminal portions and thewiring 2 were connected by wire bonds 100 (FIG. 12d). The thus-formedassembly was loaded in a die for transfer mold and sealed with asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.) 5 (FIG. 12e). Thereafter, solder balls 7were arranged at the connecting terminal portions of the wiring and werecaused to fuse there (FIG. 12f). The wiring can be connected to outerwiring via these solder balls 7. Finally, the packages connectedtogether with the polyimide film were punched out by dies (FIG. 12g).

With reference to FIGS. 13 to 15, a description will be given of thethirteenth embodiment of the present invention.

A nickel layer of 0.001 mm in thickness (not shown in FIG. 13) wasplated on one side of an electrolytic copper foil 1 of 0.035 mm inthickness. Next, a photosensitive dry film resist (“PHOTEC HN340”, tradename; product of Hitachi Chemical Co., Ltd.) was laminated, exposed andthen developed, so that a plating resist for plural sets of wiringpatterns was formed. Subsequently, electrolytic copper plating wasconducted in a copper sulfate bath. Applied further were a nickelplating to a thickness of 0.003 mm or greater and a gold plating of99.9% or higher purity to a thickness of 0.0003 mm or greater. Theplating resist was stripped off, whereby wiring 2 was formed (FIG. 13a).Next, the copper foil 1 with the wiring 2 formed thereon were dividedinto individual units and bonded to a separately-prepared stainlesssteel frame 22 (thickness: 0.135 mm) via a polyimide adhesive film (FIG.13b). For the frame, a copper alloy such as phosphor bronze, a copperfoil, a nickel foil, a nickel alloy foil or the like can also be used.As an alternative bonding method, it is possible to use inter aliabonding making use of an intermetallic eutectic reaction or bondingmaking use of an ultrasonic wave. Further, as is depicted in FIG. 14, itwas desired to inspect the wiring on the copper foil 1 beforehand, toselect only connection non-defectives 23 and then to bond thethus-selected connection non-defectives to the frame 22. In FIG. 14,there are shown the electrolytic copper foil 1, the frame 22, connectiondefectives 24, and registration holes 25. Although each cut-off copperfoil was provided with one wiring in this embodiment, plural sets ofwiring may be arranged on each cut-off copper foil. As a positionalrelationship between the frame 22 and each copper foil upon bonding themtogether, various positional relationships were feasible as shown by wayof example in FIGS. 15(a) and 15(b). FIG. 15 shows the frame 22 in planview, in which there are illustrated an opening 26 in the frame, amounting position 27 for the copper foil with the wiring, and afoil-fixing adhesive 28. Next, LSI chips 3 were mounted, andsemiconductor terminal portions and their corresponding wiring 2 wereconnected by wire bonds 100 (FIG. 13c). For mounting the LSI chips,die-bonding tapes 4′ for semiconductors were used. Here, die-bondingsilver paste or the like can be used instead of the bonding tapes 4′.For the mounting of semiconductor chips, a conventional wire-bondingmethod was used. Other methods such as Flip chips may also be used. Thethus-formed assembly was loaded in a die for transfer mold and sealedwith a semiconductor-sealing epoxy resin (“CL-7700”, trade name; productof Hitachi Chemical Co., Ltd.) 5 (FIG. 13d). Thereafter, only the copperfoil 1 was dissolved away with an alkali etchant to expose the nickel.The nickel layer was removed with a nickel stripper having lowcopper-dissolving power so that the wiring portions were exposed. Then,a solder resist 6 was coated and patterned in such a way that connectingterminal portions were exposed. Solder balls 7 were arranged at theexposed portions of the wiring and were caused to fuse there (FIG. 13e).The thus-obtained assembly was cut apart by a cutter and unnecessary cutpieces 101 of the frame 22 were eliminated, so that the assembly wasdivided into individual semiconductor packages (FIG. 13f). Each wiringcan be connected to an outer wiring via its corresponding solder balls7. This embodiment makes it possible to improve the blanking and henceto efficiently fabricate semiconductor packages.

With reference to FIG. 16, a description will be made about thefourteenth embodiment of the present invention.

An adhesive-coated polyimide film 29 of 0.07 mm in thickness was punchedby dies to form openings at portions where connecting terminal portionswere to be formed. After bonding it to a copper foil of 0.035 mm inthickness, a photosensitive dry film resist (“PHOTEC HN340”, trade name;product of Hitachi Chemical Co., Ltd.) was laminated, exposed and thendeveloped, so that an etching resist for plural sets of wiring patternswas formed. Subsequently, the copper foil was etched and the resist wasstripped off, whereby plural sets of wiring 2 are formed (FIG. 16a).Here, the connecting terminal portions and the wiring 2 can be formedusing a material which is formed of a copper foil and a polyimide coateddirectly on the copper foil (for example, “50001”, trade name; productof Hitachi Chemical Co., Ltd.). The formation of the openings can beeffected by drilling, laser beam machining such as excimer lasermachining, printing or the like. As a further alternative, they can alsobe formed by using a material, which has been obtained by impartingphotosensitivity to a polyimide, and conducting exposure anddevelopment. Instead of the polyimide, another material such as asealing resin can also be used.

After forming the plural sets of wiring on the single polyimide film asdescribed above, the wiring-formed film was divided into units. Theywere then bonded to a separately-prepared stainless steel frame 22(thickness: 0.135 mm) via a polyimide adhesive 28 (FIG. 16b). Then, LSIchips 3 were mounted, and semiconductor terminal portions and thecorresponding wiring 2 were connected by wire bonds 100 (FIG. 16c). Forthe mounting of the LSI chips, die-bonding tapes 4′ for semiconductorswere used. The thus-formed assembly was loaded in a die for transfermold and sealed with a semiconductor-sealing epoxy resin (“CL-7700”,trade name; product of Hitachi Chemical Co., Ltd.) 5 (FIG. 16d).Subsequently, solder balls 7 were arranged in the openings, which wereformed in the beginning and are to be converted to connecting terminalportions, and were caused to fuse there (FIG. 16e). The wiring can beconnected to outer wiring via these solder balls 7, respectively.Finally, the packages connected together with the frame were punched outby dies into individual packages (FIG. 16f).

With reference to FIG. 17, a description will be given of the fifteenthembodiment of the present invention.

A two-layer flexible base material was composed of a metal foil 31 andan insulating base material 32 formed directly thereon (FIG. 17a). Apredetermined resist pattern was formed on the metal foil. By a knownetching process, desired plural sets of wiring patterns 33 were formed,and the resist pattern was then stripped off (FIG. 17b). As the metalfoil, a composite metal foil, which has a thin copper layer on a carrierfoil removable in a subsequent step, or the like can also be usedbesides a single foil such as an electrolytic copper foil, a rolledcopper foil or a copper alloy foil. Specifically, a metal foil—which wasobtained by forming a nickel-phosphorus plating layer of 0.2 μm or so inthickness on one side of an electrolytic copper foil of 18 μm inthickness and then plating a thin copper layer to a thickness of 5 μm orso—was applicable. In this case, the thin copper layer is exposed byetching off the copper foil and nickel-phosphorus layer subsequent toformation of a polyimide layer on the thin copper layer. Namely, in thepresent invention, the thin copper layer may be patterned after the thincopper layer is exposed in its entirety, or the carrier foil (copperfoil/thin nickel layer) may be used as a part of a leadframe structure.

As the insulating base material, on the other hand, a polyimide materialis ordinary from the viewpoint of process heat resistance and the like.In this case, it was preferred to use, as the polyimide, a polyimidecontaining 70 mole % or more of a polyimide having repeating unitsrepresented by the following formula (1) because a marked warp would bedeveloped in the base material in a solder reflowing step if thepolyimide and the copper foil had different coefficients of thermalexpansion:

Next, holes 34 reaching the copper foil were formed at positions whichwere to be converted to connecting portions to an external substrate ina subsequent step (FIG. 17c). No particular limitation is imposed on themethod for the formation of the holes. In addition to a laser beammachining making use of an excimer laser, CO₂ laser or YAG laser, a wetetching process and so on is applicable.

A frame base material 37, which was coated with an adhesive 36 and hadbeen punched out at predetermined portions (openings 35) by punching orthe like, was then bonded to surfaces of the wiring patterns (FIG. 17d).In this case, no particular limitation is imposed on the frame basematerial and a polyimide film or a metal foil such as a copper foil isapplicable. If the thickness of the polyimide layer of the two-layerflexible base material was 25 μm and the bonded frame base material wasa polyimide film, a film thickness as much as 50 to 70 μm was requiredto assure sufficient rigidity for the whole frame. Incidentally, noparticular limitation is imposed on the area where the frame basematerial layer was formed. It is also possible to arrange the frame basematerial layer in areas where semiconductor chips were to be mounted.Specifically, where the mounting of chips was effected by thewire-bonding method, the frame base material layer may be arranged inthe entire area insofar as at least terminal portions 38 were exposedfor wire-bonding. Semiconductor chips 39 were then mounted, and thesemiconductor chips and the wiring patterns were electrically connectedtogether by gold wires 40 (FIG. 17e). Where a face-down method wasadopted as a mounting method for semiconductor chips, on the other hand,the wiring patterns were provided with metal bumps or the like atpredetermined positions (which correspond to the positions of externalconnection electrodes of the semiconductor chips), and the semiconductorchips and the wiring patterns may be electrically connected together viathe-metal bumps. The thus-obtained assembly was then loaded in a die fortransfer mold and was sealed with a resinous sealing material 41 (FIG.17f). In this case, no particular limitation is imposed on the resinoussealing material and, for example, an epoxy resin containing 5 to 80 wt.% of silica of about 10 to 20 μm in diameter can be used. Formed nextwere connecting portions 42 which are to be used for establishingconnection with external substrates. As a method for the formation ofthe connecting portions 42, it was possible to apply a method such thatbumps were formed beforehand to a thickness greater than the polyimidefilm by an electrolytic plating process after the step of FIG. 17c orsolder bumps were formed by a solder printing process after sealing withthe resin. Finally, the package portions were cut off from the frame sothat packages were obtained as desired (FIG. 17g).

The fifteenth embodiment of FIG. 17 will be described more specifically.

SPECIFIC EXAMPLE 1

A two-layer flexible base material having an electrolytic copper foil of12 μm in thickness on one side thereof (“MCF 50001”, trade name; productof Hitachi Chemical Co., Ltd.) was

provided. A dry film resist (“PHOTEC HK815”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated on the copper foil and thenexposed and developed, whereby a desired resist pattern was obtained.After the copper foil was etched with a solution of ferric chloride, theresist pattern was stripped with a solution of potassium hydroxide sothat a predetermined wiring pattern was obtained. Using an excimer laserbeam machine (“INDEX 200”, trade name; manufactured by Sumitomo HeavyIndustries, Ltd.), as many holes as needed (diameter: 300 μm) wereformed at predetermined positions so that they extend from a side of aninsulating base material and reach a back surface of the wiring pattern.The following conditions were set for the excimer laser beammachining—energy density: 250 mJ/cm², reduction ratio: 3.0, oscillationfrequency: 200 Hz, and illumination pulse number: 300 pulses. Preparednext was an adhesive sheet having a 10-μm thick polyimide-base adhesive(“AS 2250”, trade name; product of Hitachi Chemical Co., Ltd.) on oneside of a 50-μm thick polyimide film (“UPILEX S”, trade name; product ofUbe Industries, Ltd.). Predetermined areas including those correspondingto terminal portions to be used for wire bonding in a subsequent stepwere removed by punching, and the polyimide film and the two-layerflexible base material with the wiring pattern formed thereon weresubjected to thermocompression via the adhesive. The followingconditions were set for the thermo compression bonding—pressure: 20kgf/cm², temperature: 180° C., and thermocompression time: 60 minutes.By electroless nickel and gold plating processes, the terminal portionsfor the wire bonding were next applied with nickel/gold platings. Thethicknesses of these platings were 3 μm and 0.3 μm, respectively. Usinga semiconductor-chip-mounting die-bonding material (“HM-1”, trade name;product of Hitachi Chemical Co., Ltd.), semiconductor chips were thenmounted. The mounting conditions were set as follows—press pressure: 5kgf/cm², bonding temperature: 380° C., and compression-bonding time: 5seconds. External electrode portions of each semiconductor chip werethen electrically connected with its corresponding wiring pattern bywire bonding. The thus-obtained assembly was stamped into aleadframe-shaped form, loaded in a die for transfer mold and then sealedat 185° C. for 90 seconds with a semiconductor-sealing epoxy resin(“CL-7700”, trade name; product of Hitachi Chemical Co., Ltd.). Theabove-mentioned holes were then each coated with a predetermined amountof solder by a printing process. The solder was caused to fuse in aninfrared reflowing oven, so that external connection bumps were formed.Finally, the package portions were punched out by dies so that packageswere obtained as desired.

With reference to FIG. 18, a description will be made of the sixteenthembodiment of the present invention.

A two-layer flexible base material was composed of a metal foil 31 andan insulating base material 32 formed directly thereon (FIG. 18a). Apredetermined resist pattern was formed on the metal foil. By a knownetching process, desired plural sets of wiring patterns 33 were formed,and the resist pattern was then stripped off (FIG. 18b). As the metalfoil, a composite metal foil, which has a thin copper layer on a carrierfoil removable in a subsequent step, or the like can also be usedbesides a single foil such as an electrolytic copper foil, a rolledcopper foil or a copper alloy foil. Specifically, a metal foil—which wasobtained by forming a nickel-phosphorus plating layer of 0.2 μm or so inthickness on one side of an electrolytic copper foil of 18 μm inthickness and then plating a thin copper layer to a thickness of 5 μm orso—was applicable. In this case, the thin copper layer was exposed byetching off the copper foil and nickel-phosphorus layer subsequent toformation of a polyimide layer on the thin copper layer. Namely, in thepresent invention, the thin copper layer may be patterned after the thincopper layer is exposed in its entirety, or the carrier foil (copperfoil/thin nickel layer) may be used as a part of a leadframe structure.As the insulating base material, on the other hand, a polyimide materialis ordinary from the viewpoint of process heat resistance and the like.In this case, it is preferred to use, as the polyimide, a polyimidecontaining 70 mole % or more of a polyimide having repeating unitsrepresented by the formula (1) because a marked warp will be developedin the base material in a solder reflowing step if the polyimide and thecopper foil have different coefficients of thermal expansion.

Next, holes 34 reaching the copper foil were formed at positions whichwere to be converted to connecting portions to external substrate in asubsequent step (FIG. 18c). No particular limitation is imposed on themethod for the formation of the holes. In addition to a laser beammachining making use of an excimer laser, CO₂ laser, or YAG laser, a wetetching process or the like is applicable.

A frame base material 37, which was coated with an adhesive 36 and hadbeen punched out at predetermined portions (openings 35) by punching orthe like, was then bonded as a second insulating base material tosurfaces of the wiring patterns (FIG. 18d). If the thickness of thepolyimide layer of the two-layer flexible base material is 25 μm, a filmthickness as much as 50 to 70 μm is required as a thickness of apolyimide film to be bonded in view of a subsequent step in which thepolyimide film was fixed on a frame. Incidentally, no particularlimitation is imposed on the area where the polyimide is bonded. Itsarrangement in areas where semiconductor chips are to be mounted makesit possible to form external connection terminals under thesemiconductor chips like CSPs. Specifically, where the mounting of chipswas effected by the wire-bonding method, the polyimide film may bebonded in the entire area insofar as at least terminal portions 38 areexposed for wire-bonding. The insulating substrate obtained as describedabove was divided into the individual wiring patterns (FIG. 18e) andwere then fixed on a separately-prepared frame 43 made, for example, ofSUS or the like (FIG. 18f). Semiconductor chips 39 were then mounted,and the semiconductor chips and the wiring patterns were electricallyconnected together by gold wires 40 (FIG. 18g). Where a face-down methodwas adopted as a mounting method of semiconductor chips, on the otherhand, the wiring patterns are provided with metal bumps or the like atpredetermined positions (which correspond to the positions of externalconnection electrodes of the semiconductor chips), and the semiconductorchips and the wiring patterns may be electrically connected together viathe metal bumps. The thus-obtained assembly was then loaded in a die fortransfer mold and was sealed with a resinous sealing material 41 (FIG.18h). In this case, no particular limitation is imposed on the resinoussealing material and, for example, an epoxy resin containing 5 to 80 wt.% of silica of about 10 to 20 μm in diameter can be used. Formed nextare connecting portions 412 which are to be used for establishingconnection with external substrates. As a method for the formation ofthe connecting portions 42, it was possible to apply a method such thatbumps were formed beforehand to a thickness greater than the polyimidefilm by an electrolytic plating process after the step of FIG. 18c orsolder bumps were formed by a solder printing process after sealing withthe resin. Finally, the package portions were cut off from the frame sothat packages are obtained as desired (FIG. 18i).

The sixteenth embodiment of FIG. 18 will be described more specifically.

SPECIFIC EXAMPLE 2

A two-layer flexible base material having an electrolytic copper foil of12 μm in thickness on one side thereof (“MCF 5000I”, trade name; productof Hitachi Chemical Co., Ltd.) was provided. A dry film resist (“PHOTECHK815”, trade name; product of Hitachi Chemical Co., Ltd.) was laminatedon the copper foil and then exposed and developed, whereby a desiredresist pattern was obtained. After the copper foil was etched with asolution of ferric chloride, the resist pattern was stripped with asolution of potassium hydroxide so that a predetermined wiring patternwas obtained. Using an excimer laser beam machine (“INDEX 200”, tradename; manufactured by Sumitomo Heavy Industries, Ltd.), as many holes asneeded (diameter: 300 μm) were formed as many as needed at predeterminedpositions so that they extend from a side of an insulating base materialand reach a back surface of the wiring pattern. The following conditionswere set for the excimer laser beam machining—energy density: 250mJ/cm², reduction ratio: 3.0, oscillation frequency: 200 Hz, andillumination pulse number: 300 pulses. Prepared next was an adhesivesheet having a 10-μm thick polyimide-base adhesive (“AS 2250”, tradename; product of Hitachi Chemical Co., Ltd.) on one side of a 50-μmthick polyimide film (“UPILEX S”, trade name; product of Ube Industries,Ltd.). Predetermined areas including those corresponding to terminalportions to be used for wire bonding in a subsequent step were removedby punching, and the polyimide film and the two-layer flexible basematerial with the wiring pattern formed thereon were subjected tothermocompression via the adhesive. The following conditions were setfor the thermo compression bonding—pressure: 20 kgf/cm², temperature:180° C., and thermocompression time: 60 minutes. By electroless nickeland gold plating processes, the terminal portions for the wire bondingwere next applied with nickel/gold platings. The thicknesses of theseplatings were 3 μm and 0.3 μm, respectively. The thus-obtained substratewas, divided into the individual wiring patterns and was fixed on aseparately-prepared SUS frame. Using a semiconductor-chip-mountingdie-bonding material (“HM-1”, trade name; product of Hitachi ChemicalCo., Ltd.), semiconductor chips were then mounted. The mountingconditions were set as follows—press pressure: 5 kgf/cm², bondingtemperature: 380° C., and compression-bonding time: 5 seconds. Externalelectrode portions of each semiconductor chip were then electricallyconnected with its corresponding wiring pattern by wire bonding. Thethus-obtained assembly was molded into a leadframe-shaped form, loadedin a die for transfer mold and then sealed at 85° C. for 90 seconds witha semiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.). The above-mentioned holes were then eachcoated with a predetermined amount of solder by a printing process. Thesolder was caused to fuse in an infrared reflowing oven, so thatexternal connection bumps were formed. Finally, the package portionswere punched out by dies so that packages were obtained as desired.

With reference to FIGS. 19, 20 and 21, a description will be given ofthe seventeenth embodiment of the present invention.

Plural sets of predetermined wiring patterns 52 were formed on asupporting member 51 (FIG. 19a). As the supporting member, an insulatingbase material such as a polyimide film can be used besides a metal foilsuch as an electrolytic copper foil. When an insulating base materialare used, there were two methods. According to the first method,nonthrough-holes reaching the wiring patterns were formed atpredetermined positions of the insulating base material, and externalconnection terminals were formed at exposed portions of the wiringpatterns. The nonthrough-holes can be formed by applying an excimerlaser or a CO₂ laser and so on. According to the second method, adrilled insulating base material provided with an adhesive was formed inadvance and, subsequent to lamination with an electrolytic copper foilor the like, the copper foil was subjected to etching.

When a metal foil was used, on the other hand, a resist pattern wasformed with a photoresist and wiring patterns were then formed byelectroplating while using the metal foil as a cathode. In this case, itwas possible to use a conventional electrolytic copper foil and a foilconsisting of an electrolytic copper foil and a thin layer of a metal(nickel, gold, solder or the like) different in chemical etchingconditions from the copper foil provided thereon. Further, copper ispreferred for the wiring patterns. However, when an electrolytic copperfoil was used as a supporting member as mentioned above, it wasnecessary to use a metal, which is different in etching conditions fromthe copper foil, for the wiring patterns or to form a patterned thinlayer, which will serve as a barrier layer upon etching the copper foil,before application of a patterned copper plating.

Next, after semiconductor devices 54 were mounted by die-bondingmaterials 53, terminals of the semiconductor devices and wiring patternswere electrically connected (FIG. 19b), and plural sets of thesemiconductor devices and wiring patterns were all together sealed witha resinous sealing material 56 by the transfer molding process (FIG.19c). No particular limitation is imposed on the resinous sealingmaterial and, for example, an epoxy resin containing 5 to 80 wt. % ofsilica of about 10 to 20 μm in diameter can be used. The presentinvention is not limited to cases making use of a face-up method as amounting method for semiconductor devices but is also applicable tocases making use of a face-down method. Specifically, it was onlynecessary to form bumps for face-down bonding at predetermined positionson the wiring patterns 52 by a plating process or the like and then toelectrically connect external connecting portions of the semiconductordevices with the bumps. Further, it was effective to make to packageseasy to divide in a subsequent step as shown in FIG. 20 and FIG. 21. Ofthese, FIG. 20 shows grooves 59 formed in boundary portions betweenindividual package portions. The width, depth and the like of eachgroove can be modified depending on the dimensions which the die fortransfer mold can receive for processing. Further, FIG. 21 illustrates atransfer molding process which was carried out using a grid-shapedintermediate plate 60 hollowed out beforehand at areas corresponding tothe individual package portions. Where the supporting member was a metalfoil, the supporting member was removed by a chemical etching processand external connection terminals 57 were formed at predeterminedpositions (FIG. 19d). When an insulating base material was used as asupporting member, it was only necessary to selectively remove theinsulating base material at predetermined areas by a laser or the like.Finally, the substrate which had been sealed as a whole was cut apartinto unit portions 58. Incidentally, a solder resist layer may be formedon exposed surfaces of the wiring patterns for protecting the wiringpatterns.

The seventeenth embodiment will be described specifically.

SPECIFIC EXAMPLE 3

On a shiny surface of an electrolytic copper foil of 35 μm in thicknessand 250 mm squares in external shape, a photosensitive dry film resist(“PHOTEC HN640”, trade name; product of Hitachi Chemical Co., Ltd.) waslaminated, followed by exposure and development so that a desired resistpattern (minimum line/space =50 μm/50 μm) was formed. As many as 300 (4blocks/250 mm squares, 75 patterns/block) identical wiring patternswhich were each consisted of 0.2 μm thick nickel, 30 μm thick copper, 5μm thick nickel and 1 μm thick soft gold were next formed by anelectroplating method. The resist pattern was next stripped off using a3 wt. % solution of potassium hydroxide of 35° C. The resultant assemblywas dried at 85° C. for 15 minutes and then cut into the individualblocks. Using a semiconductor-device-mounting die-bonding material(“HM-1”, trade name; product of Hitachi Chemical Co., Ltd.),semiconductor devices were then bonded. The bonding conditions were setas follows—press pressure: 5 kgf/cm², temperature: 380° C., andcompression-bonding time: 5 seconds. External terminals of eachsemiconductor device were then electrically connected with itscorresponding gold-plated terminal portions (second connecting portions)by wire bonding. The thus-obtained assembly was loaded in a die fortransfer mold. Using a semiconductor-sealing epoxy resin (“CL-7700”,trade name; product of Hitachi Chemical Co., Ltd.), the 75 wiringpatterns (corresponding to 1 block) were sealed all together at 185° C.for 90 seconds so that the individual wiring patterns were transferredinto the sealing material. Next, the electrolytic copper foil was etchedoff at desired portions with an alkali etchant (“A Process”, trade name;product of Japan Meltex, Inc.). The temperature and spraying pressure ofthe etching solution were 40° C. and 1.2 kgf/cm², respectively. Solderpatterns were then formed at external connection terminal portions by aprinting process. The solder was caused to fuse in an infrared reflowingoven, so that external connection bumps were formed. Finally, theassembly was divided into individual package portions by a diamondcutter so that packages were obtained as desired.

SPECIFIC EXAMPLE 4

On a shiny surface of an electrolytic copper foil of 35 μm in thicknessand 250 mm squares in external shape, a photosensitive dry film resist(“PHOTEC HN640”, trade name; product of Hitachi Chemical Co., Ltd.) waslaminated, followed by exposure and development so that a desired resistpattern (minimum line/space=50 μm/50 μm). As many as 300 (4 blocks/250mm squares, 75 patterns/block) identical wiring patterns which were eachconsisted of 0.2 μm thick nickel, 30 μm thick copper, 5 μm thick nickeland 1 μm thick soft gold were next formed by an electroplating method.The resist pattern was next stripped off using a 3 wt. % solution ofpotassium hydroxide of 35° C. The resultant assembly was dried at 85° C.for 15 minutes and then cut into the individual blocks. Using asemiconductor-device-mounting die-bonding material (“HM-1”, trade name;product of Hitachi Chemical Co., Ltd.), the semiconductor devices werethen bonded. The bonding conditions were set as follows—press pressure:5 kgf/cm², temperature: 380° C., and compression-bonding time: 5seconds. External terminals of each semiconductor device were thenelectrically connected with its corresponding gold-plated terminalportions (second connecting portions) by wire bonding. Using as anintermediate plate a grid-shaped stainless steel plate hollowed out atareas corresponding to individual package areas, the thus-obtainedassembly was loaded in a die for transfer mold. Using asemiconductor-sealing epoxy resin (“CL-7700”, trade name; product ofHitachi Chemical Co., Ltd.), the 75 wiring patterns (corresponding to 1block) were sealed all together at 185° C. for 90 seconds so that theindividual wiring patterns were transferred into the sealing material. Agrid portion of the intermediate plate was tapered at 12° to facilitateseparation of the individual packages from the intermediate plate. Next,the electrolytic copper foil was etched off at desired portions with analkali etchant (“A Process”, trade name; product of Japan Meltex, Inc.).Each package portion was held in place by the grid-shaped intermediateplate. The temperature and spraying pressure of the etching solutionwere 40° C. and 1.2 kgf/cm², respectively. Finally, solder patterns wereformed at external connection terminal portions by a printing process.The solder was caused to fuse in an infrared reflowing oven, so thatexternal connection bumps were formed. Individual package portions wereseparated from the intermediate plate so that packages were obtained asdesired.

With reference to FIG. 22, a description will be given of the eighteenthembodiment of the present invention.

Plural sets of predetermined resist patterns 62 (FIG. 22b) were formedon an electrically-conductive temporary supporting member 61 (FIG. 22a).Next, wiring patterns 63 were formed at exposed portions of thetemporary supporting member by an electroplating process. In this case,no particular limitation is imposed on the temporary supporting member.For example, it was possible to use a conventional electrolytic copperfoil and a foil consisting of an electrolytic copper foil and a thinlayer of a metal (nickel, gold, solder or the like) different inchemical etching conditions from the copper foil provided thereon.Further, copper is preferred for the wiring patterns. However, when anelectrolytic copper foil was used as a temporary supporting member asmentioned above, it was necessary to use a metal, which is different inetching conditions from the copper foil, for the wiring patterns or toform a patterned thin layer, which will serve as a barrier layer uponetching the copper foil, before application of a patterned copperplating. No particular limitation is imposed on the thickness of thetemporary supporting member insofar as no inconvenience or problemarises in matters such as the handling in subsequent steps and thedimensional stability upon packaging semiconductor devices. After aplating (usually, nickel/gold) 64 which was to be used for gold wirebonding was applied using the temporary supporting member as a cathode,the resist pattern was removed (FIG. 22c). The present invention is notlimited to cases making use of a face-up method as a mounting method forsemiconductor devices but is also applicable to cases making use of aface-down method for example. Specifically, it was only necessary toform bumps for face-down bonding at predetermined positions on thewiring patterns 63 by a plating process or the like and then toelectrically connect external connecting portions of the semiconductordevices with the bumps.

Next, after semiconductor devices 65 were bonded by die-bondingmaterials 66, external connection terminals of the semiconductor devicesand their corresponding wiring patterns were electrically connected(FIG. 22d). The resultant assembly was then loaded in a die for transfermold and was sealed with a resinous sealing material 68 (FIG. 22e). Inthis case, no particular limitation is imposed on the resinous sealingmaterial and, for example, an epoxy resin containing 5 to 80 wt. % ofsilica of about 10 to 20 μm in diameter can be used.

Then, predetermined metal patterns 69 were formed at positionscorresponding to the external connection terminals (FIG. 22f). In thiscase, any metal could be used insofar as it was not etched underconditions for etching off the electrically-conductive temporarysupporting member. For example, solder, gold, nickel/gold or the likecan be used. As a process for the formation of the metal patterns, aknown electroplating process or solder printing process can be applied.Further, when forming solder patterns as the metal patterns 69 by aprinting process, solder bumps 70 could be formed by reflowing. In thiscase, by adjusting the thickness of the patterns 69, it was possible tocontrol the height of the reflowed solder bumps 70. The temporarysupporting member was next removed at predetermined portions while usingthe metal patterns as an etching resist, whereby the wiring patternswere exposed. Finally, the assembly was divided into individual packages71 by stamping or dicing (FIG. 22g). Incidentally, where the exposedwiring patterns are not protected by a corrosion-resistant metal such asnickel, areas other than the external connection terminal portions maybe coated with a known solder resist or the like. When using solder asmetal patterns, no particular limitation was imposed on the reflowingstep. The reflowing step can be performed either before or afterdividing the assembly into the individual packages. As a furtheralternative, the reflowing step can also be conducted before mountingthe individual packages on external wiring boards.

The eighteenth embodiment will be described specifically.

SPECIFIC EXAMPLE 5

On a shiny surface of an electrolytic copper foil of 70 μm in thickness,a photosensitive dry film resist (“PHOTEC HN640”, trade name; product ofHitachi Chemical Co., Ltd.) was laminated, followed by exposure anddevelopment so that a desired resist pattern (minimum line/space=50μm/50 μm) was formed. Wiring patterns which were each consisted of 0.2μm thick nickel, 30 μm thick copper, 5 μm thick nickel and 1 μm thicksoft gold were next formed by an electroplating method. The resistpattern was next stripped off using a 3 wt. % solution of potassiumhydroxide of 35° C. After the resultant assembly was dried at 85° C. for15 minutes, semiconductor devices were bonded using asemiconductor-device-mounting die-bonding material (“HM-1”, trade name;product of Hitachi Chemical Co., Ltd.). The bonding conditions were setas follows—press pressure: 5 kgf/cm², temperature: 380° C., andcompression-bonding time: 5 seconds. External terminals of eachsemiconductor device were then electrically connected with itscorresponding gold-plated terminal portions (second connecting portions)by wire bonding. The thus-obtained assembly was loaded in a die fortransfer mold. Using a semiconductor-sealing epoxy resin (“CL-7700”,trade name; product of Hitachi Chemical Co., Ltd.), the assembly wassealed at 185° C. for 90 seconds so that the wiring patterns weretransferred into the sealing material. Next, a photosensitive dry filmresist (“PHOTEC HN340”, trade name; product of Hitachi Chemical Co.,Ltd.) was laminated on an electrolytic copper foil, followed by exposureand development so that a desired resist pattern was formed. A 40 μmthick solder pad (diameter: 0.3 mm, arrangement pitch: 1.0 mm) wasformed by an electroplating method. Next, after the dry film resist wasstripped off, the electroplated copper foil was etched off at desiredportions with an alkali etchant (“A Process”, trade name; product ofJapan Meltex, Inc.). The temperature and spraying pressure of theetching solution were 40° C. and 1.2 kgf/cm², respectively. Finally, thesolder was caused to fuse in an infrared reflowing oven, so thatexternal connection bumps were formed.

With reference to FIGS. 23, 24 and 25, a description will be given ofthe nineteenth embodiment of the present invention.

The construction of a semiconductor mounting frame will be describedwith reference to FIG. 23. Numeral 89 indicates semiconductor-mountingsubstrates, each of which consisted of an insulating base material andwiring. Plural substrates were connected together via connectingportions 90. Each connecting portion 90 was provided with pinholes 91 asreference positions. Recognition marks employed in image recognition maybe used in place of the pinholes 91. Based on these reference positions,positioning is performed in subsequent steps. Especially upon moldingsemiconductors with resin, positional registration was effected byinserting pins, which were arranged inside a cavity, in the pinholes 91.

Referring to FIGS. 24 and 25, a further description will be given. Anickel layer of 0.001 mm in thickness (not shown in FIGS. 24 and 25) wasformed by an electrolytic plating process on one side of an electrolyticcopper foil 81 of about 0.070 mm in thickness which is anelectrically-conductive temporary substrate. Next, a photosensitivedry-film resist (“PHOTEC HN340”, trade name; product of Hitachi ChemicalCo., Ltd.) was laminated, followed by exposure and development so that aplating resist for plural sets of wiring patterns was formed. Theintensity of the exposure at this time was 70 mJ/cm². Further,electrolytic copper plating was conducted in a known copper sulfate bathand the resist was stripped off, whereby plural sets of wiring 82 wereformed (FIG. 24a, FIG. 25a). Here, as is illustrated in FIG. 25a, it maybe contemplated to form plated copper 82′ at the connecting portionstoo. This makes it possible to provide the resulting frame with stillenhanced rigidity. Each of the constructions shown in FIG. 24a and FIG.25a can also be obtained by providing beforehand a base materialcomposed of three layers of copper/thin nickel layer/copper and formingone of the copper foils into wiring in a usual etching step. Further,the construction of the copper foil 81/thin nickel layer (notshown)/copper wirings 82 (and 82′) obtained here may be replaced by atwo-layer structure free of the thin nickel layer, such as copperfoil/nickel wirings, nickel foil/copper wirings, or the like. Althoughthe selectable kinds of metals are not limited to those of the presentembodiment, it is a preferred standard for the selection to allowwirings to selectively remain when some parts of the temporary substrateare etched off in a subsequent step (FIG. 24c, FIG. 25c). As theelectrically-conductive temporary substrate becomes a material whichmakes up the connecting portions of the frame, a greater thickness ispreferred. There is however a subsequent step to etch it off partly, sothat it is necessary to select an appropriate thickness. The thicknessof the electrically-conductive temporary substrate varies depending onthe material. For example, when a copper foil was used, about 0.03 to0.3 mm or so was preferred. A polyimide adhesive 83 is next applied tothe wiring-containing surface of the copper foil 81 with the plural setsof wiring 82 formed thereon. Here, the polyimide adhesive 83 is notlimited to this material. It is possible to use, for example, an epoxyadhesive film, a film formed of a polyimide film and an adhesive coatedthereon, or the like. Next, holes 84 for the external connectionterminals were formed using an excimer laser (FIG. 24b, FIG. 25b). Forthe sake of simplification of subsequent steps, it was suited to arrangeconnecting terminals before mounting semiconductors. As another methodfor the formation of these holes 84, it was possible to form beforehandthe holes 84 for the external connection terminals in a film by drillingor punching and then to bond the film so formed. Although no problem orinconvenience would arise even if a metal to be employed as theconnecting terminals (which are designated at numeral 88 in FIG. 24f andFIG. 25f), such as a solder or the like, is filled at this stage, theresulting metal bumps may become an obstacle in the subsequentsemiconductor mounting step and resin sealing step. Thus, it ispreferred to form a metal at a subsequent step. It is preferred tolocate the holes for the external connection terminals (or terminals) inthe mounting substrate portions for the semiconductor devices, in theform of-arrays on the side opposite to the side on which thesemiconductor devices are mounted.

Next, a portion of the electrolytic copper foil as the temporarysubstrate, the portion being the area where the wiring patters areformed, was etched off. As this etching solution, it is preferred tochoose an etching solution and etching conditions, which in the case ofthis embodiment, provide a substantially higher dissolution velocity forcopper than for nickel. Employed in this embodiment were an alkalietchant (“A Process”, trade name; product of Japan Meltex Inc.) as anetching solution and, for example, a solution temperature of 40° C. anda spray pressure of 1.2 kgf/cm². It is to be noted that the kind ofsolution and the conditions specified here are merely illustrative. Bythis step, the thin nickel layer in the substrate was exposed. Uponetching only this thin nickel layer, it is preferred to choose anetching solution and etching conditions so that a substantially higherdissolution velocity is provided for nickel than for copper. In thisembodiment, selective etching was conducted with a nickel etchant(“Melstrip N950”, trade name; product of Japan Meltex, Inc.). Thetemperature and spraying pressure of the etching solution were set at40° C. and 1.2 kgf/cm², respectively. It is to be noted that the kind ofthe solution and conditions specified here are merely illustrative.Through these steps, the temporary substrate was allowed to remain asthe connecting portions, whereby a semiconductor mounting frame havingrigidity was obtained (FIG. 24c, FIG. 25c). In this embodiment,electroless nickel-gold plating was applied to terminal portions of thecopper wirings on this frame (not shown). This was needed forwire-bonding chips in a subsequent step. Such surface treatment can beapplied as needed.

Semiconductor chips 85 were then mounted. For bonding the semiconductorchips, semiconductor die-bonding tapes 86 (for example, “HM-1”, tradename; product of Hitachi Chemical Co., Ltd.) were used. If there is nowiring under the chips, the chips may be bonded using a die-bondingsilver paste. Next, terminal portions of the semiconductors and thewiring were connected by wire bonds 100 (FIG. 24d, FIG. 25d). Theconnection with the terminals of the semiconductors can be effected byanother method, for example, by face-down connection making use of Flipchips or by bonding making use of an anisotropic conductive adhesive.The assembly so formed was loaded in a die for transfer mold and wassealed using a semiconductor-sealing epoxy resin (“CL-7700”, trade name;product of Hitachi Chemical Co., Ltd.) 87 (FIG. 24e, FIG. 25e).Thereafter, solder balls 88 were arranged in the connecting holes formedat connecting terminal portions of the wiring 82 and were then caused tofuse (FIG. 24f, FIG. 25f). These solder balls 88 become so-calledexternal connection terminals. The plural semiconductor devicesconnected together by the connecting portions 102 were punched by dies,so that the individual semiconductor devices were obtained (FIG. 24gFIG. 25g).

In this embodiment, the semiconductor mounting frame and semiconductordevice fabrication process made it possible to obtain a frame havingsufficient rigidity in the fabrication of semiconductor devices, such asBGAs, CSPs or the like, by using a film-shaped substrate such as apolyimide tape and so on. By using this frame, semiconductor devices canbe fabricated with high accuracy and efficiency.

Owing to the present invention, semiconductor packages capable ofmeeting the move toward higher integration of semiconductor chips can befabricated stably with good productivity.

What is claimed is:
 1. A process for the fabrication of a semiconductorpackage, which comprises the following steps: 1A) forming wiring on oneside of a conductive temporary supporting member; 1B) mounting asemiconductor device on said conductive temporary supporting member onwhich said wiring has been formed, and then electrically connecting aterminal of said semiconductor device with said wiring; 1C) seating saidsemiconductor device with resin; 1D) removing said conductive temporarysupporting member to expose said wiring; 1E) forming an insulating layerover said exposed wiring pattern at an area other than position where anexternal connection terminal is to be formed; and 1F) forming saidexternal connection terminals on said wiring pattern at said positionswhere said insulating layer has not been formed.
 2. A process for thefabrication of a semiconductor package, which comprises the followingsteps: 2A) forming wiring on one side of a conductive temporarysupporting member; 2B) forming an insulating supporting member over saidone side of said conductive temporary supporting member, said one sidecarrying said wiring formed thereon; 2C) removing said conductivetemporary supporting member to transfer said wiring pattern onto saidinsulating supporting member; 2D) removing said insulating supportingmember at positions where an external connection terminal is to beformed for said wiring pattern, whereby a through-holes is formed forsaid external connection terminal; 2E) mounting a semiconductor deviceon said insulating supporting member on which said wiring has beentransferred, and then electrically connecting a terminal of saidsemiconductor device with said wiring; 2F) sealing said semiconductordevice with resin; and 2G) forming, in said through-hole for saidexternal connecting terminal, said external connection terminal so thatsaid external connection terminal is electrically connected to saidwiring.
 3. A process for the fabrication of semiconductor packages,which comprises the following steps: 6A) forming plural sets of wiringon one side of a conductive temporary supporting member; 6B) cuttingapart said conductive temporary substrate so that said plural sets ofwiring formed on said conductive temporary supporting member are dividedto include a predetermined number of wiring per unit, and then fixing ona frame said separated conductive temporary supporting member with saidwiring formed thereon; 6C) mounting semiconductor devices on saidconductive temporary substrates on which said wiring have been formed,and then electrically connecting terminals of said semiconductor deviceswith said wiring, respectively; 6D) sealing said semiconductor deviceswith resin; 6E) removing said conductive temporary substrate to exposesaid wiring; 6F) forming an insulating layer over said exposed wiringpatterns at areas other than positions where external connectionterminals are to be formed; 6G) forming said external connectionterminals at said positions where said insulating layer for the wiringhas not been formed; and 6H) separating the resultant assembly intoindividual semiconductor packages.
 4. A process for the fabrication of asemiconductor device packaging frame, said frame being provided withplural semiconductor-device-mounting portions, portions connectingtogether said plural semiconductor-device-mounting portions, and aregistration mark portion, which comprises the following steps: (a)forming wiring for said semiconductor-device-mounting portions on aconductive temporary substrate, (b) transferring said wiring onto aresin substrate, and (c) etching off said conductive temporarysubstrate; wherein upon etching off said conductive temporary substratein step (c), said conductive temporary substrate partly remains to formsome of said connecting portions.